Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling
نویسندگان
چکیده
منابع مشابه
Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling
We report a new mode of spatial-phase-locked electron-beam lithography based on alignment of each e-beam deflection field to a fiducial grid on the substrate. Before exposing the pattern in a given field, the fiducial grid is sparsely sampled with the electron beam at a subexposure dose. These samples form a two-dimensional moiré pattern that is analyzed to calculate field shift, scale, rotatio...
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Spatial-Phase-Locked Electron-Beam Lithography (SPLEBL) promises to reduce pattern-placement errors in electron-beam-lithography systems to the nanometer level. Such high precision is essential for a variety of future lithographic applications. SPLEBL is currently the only approach capable of achieving such accuracy. In SPLEBL, a low-level, periodic signal, derived from the interaction of the s...
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We describe a technique to fabricate Bragg gratings in the sides of optical waveguides using a single lithographic step. This technique is particularly suited to the apodized gratings required for add/drop filters in dense-wavelength-division multiplexing. Apodization minimizes cross talk between channels and improves the filter response. Silicon-on-insulator rib waveguides with both uniform an...
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Our research in spatial-phase-locked electron-beam lithography (SPLEBL) is aimed at reducing pattern-placement errors in electron-beam-lithography systems to the 1 nm level. Such high precision is essential for a variety of future lithographic applications. SPLEBL is currently the only approach capable of achieving such accuracy. As shown in Figure 1, SPLEBL uses a periodic signal, derived from...
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Spatial-phase-locked electron-beam lithography (SPLEBL) promises significant improvement in the pattern fidelity and placement accuracy of electron-beam lithography by the introduction of feedback into the writing loop. In the planned formulation of SPLEBL, the feedback signal is produced by a reference grid which is bleached into a thin scintillating layer integrated into the electron-beam sta...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
سال: 2000
ISSN: 0734-211X
DOI: 10.1116/1.1314371